Molecular dynamics simulation of processing using AFM pin tool

A three-dimensional molecular dynamics (MD) model is utilized to investigate the effect of tool geometry on the deformation process of the workpiece and the nature of deformation process at the atomic-scale. Results show that different states exist between the atomic force microscope (AFM) pin tool and the workpiece surface, i.e. the non-wear state, the ploughing state, the state in which ploughing is dominant and the state in which cutting plays a key role. A relationship between the deformation process of the workpiece and the potential energy variation is presented. The potential energy variation of atoms in different deformed regions in the workpiece such as plastically deformed region, elastically deformed region and the mixed deformation region is different. The features of variations of potential energy are discussed.     

Canonical Modules of Semigroup Rings and a Conjecture of Reiner

We prove that the homotopy types of two naturally defined simplicial complexes are related in the following way: one is homotopy equivalent to a multiple suspension of the canonical Alexander dual of the other. These simplicial complexes arise in free resolutions of semigroup rings and modules. The relation between their homotopy types was conjectured by Reiner, and was suggested by a homological consequence of a result due independently to Danilov and Stanley on canonical modules of normal semigroup rings. Our proof is purely topological, and gives an alternative proof of their result. We also prove a generalization of a result of Hochster saying that these rings are Cohen—Macaulay, and indicate a new proof of Ehrhart's reciprocity law for rational polytopes. Received October 3, 2000, and in revised form April 2, 2001, and May 10, 2001. Online publication November 7, 2001.     

Sm3+掺杂稀土硼酸盐玻璃的光谱参数计算和荧光光谱分析

制备了具有高效可见荧光发射的Sm3 掺杂稀土硼酸盐(LBLB)玻璃,对玻璃的吸收和荧光光谱展开了测试与分析.根据Judd-Ofelt理论对吸收光谱进行了拟合,求得Sm3 离子的晶场调节参数Ωt=(2,4,6)分别为6.81×10-20,4.43×10-20和2.58×10-20 cm2,并进一步计算出各能级跃迁的谱线强度、自发辐射跃迁概率、辐射寿命和荧光分支比等光谱参数.紫外光激发下,Sm3 掺杂LBLB玻璃发出明亮的橙红色光.激发光谱表明,氩离子激光器是Sm3 掺杂LBLB玻璃有效的激发光源.     

脉冲电场屏蔽效能测试系统及测试方法

 自主研制了一套小型脉冲电场屏蔽效能测试系统，该系统由脉冲电场发射设备和脉冲电场测试设备构成。脉冲电场发射设备的天线口面前60 cm处可产生峰值达7.5 kV/m的脉冲电场，测试设备的动态测试范围达97 dB。系统采用光纤测量设备，在测量工作中能有效抑制强电磁场干扰。采用Matlab编写自动测量及数据处理程序，实现了数据采集与处理自动化。实验测量了金属桥架、控制柜、屏蔽帐篷、导电水泥混凝土房的脉冲电场屏蔽效能，其脉冲电场峰值衰减量分别为52,64,66,30 dB。实验表明可用脉冲电场的峰值衰减量来评估屏蔽体的脉冲电场屏蔽效能。     

激光诱导荧光探测水体中溶解有机物浓度

用Nd∶YAG激光器的三倍频355 nm光作为激发光源,根据激光诱导荧光(LIF)方法激发并探测污染水体的荧光光谱.通过对荧光光谱的分析处理研究归一化荧光强度,即450 nm处水中溶解有机物(DOM)峰与405 nm处水的拉曼峰的比值,反演溶解有机物浓度.用商品腐殖酸和去离子水配置成已知浓度的溶液代替标准DOM溶液进行标定,得到回归方程.结果证明,DOM的归一化荧光强度与水体中DOM浓度有较好的线性关系,因此LIF方法是对大面积水域水质进行动态遥测的较理想方法.     

单甲基原位改性SiO2疏水减反膜的制备与性能研究

 在碱性条件下通过TEOS和MTES的共水解缩聚反应制备了单甲基原位改性的SiO₂溶胶，并使用提拉法在K9玻璃基片上镀制了疏水减反膜。通过透射电镜（TEM）考察了镀膜溶胶的微结构，分别使用红外光谱（FTIR）分析了薄膜的组分，用原子力显微镜（AFM）观察了薄膜的表面形貌和起伏状况，用紫外可见光谱（UV-vis）考察了薄膜的减反射性能，用接触角仪测量了薄膜对水的接触角。并使用“R-on-1”的方式测量了薄膜在Nd:YAG激光（1 064 nm，1 ns）作用下的损伤阈值。结果表明，通过共水解缩聚反应可以把甲基引入镀膜溶胶簇团中，改善了溶胶簇团的网络结构，使薄膜得到相当好的疏水性能和更好的抗激光损伤性能，同时薄膜能保持较好的减反射性能。     

直流稳压电源波形演示器制作说明

直流稳压电源可以将交流电压变换为直流电压,并使之稳定,在我们现实生活中应用很广泛,在实验中我们利用的电学知识,设计制造了一种直流稳压电源。本文简要介绍了这种直流稳压电源波形演示器的设计目的和电路原理,重点阐述了它的制作流程、滤波和稳压原理以及性能测试输出波形。     

40Ar+238U 实验介绍

主要介绍了利用兰州重离子加速器提供的270 MeV的40Ar离子束轰击238U靶，通过熔合蒸发反应进行试合成Z=110附近的新同位素的实验情况。分析了目前关于超重核研究的现状并描述了这次实验的目的、 可行性分析、 实验装置以及实验过程等。本次实验仍然用氦喷嘴技术对产物进行传输， 并用一套具有数对探测器组的转轮收集探测系统对产物进行收集和测量。 The state of the experiment to produce the new isotopes around Z=110 are presented in this paper. The emphasis is laid upon introducing the experiment purpose, the set up and the feasibility for producing this objective nuclide. In the experiment the new isotopes were produced by the complete fusion evaporation reaction of 238U with 270 MeV 40Ar at the Sector Focus Cyclotron (SFC) of Heavy Ion Research Facility in Lanzhou(HIRFL). The reaction products were also transported and collected by using the helium jet technique and rotating wheel apparatus.     

重写系统和的合流性

在实际应用中,常常使用多个重写系统。本文主要讨论重写系统和的合流性,并给出了一个重写系统和具有合流性的充分条件。     

光学低通滤波器的光学传递函数分析

光电成像系统的抽样过程会引起图像频谱在频谱空间上的多次复制,如果抽样过程不满足系统的奈奎斯特条件,相邻的频谱项就会产生混叠.光学传递函数可以反映系统中光学成像,抽样和重建等各个过程对图像信号频谱的响应.通过对使用光学低通滤波器(OLPF)光电成像系统的光学传递函数的分析,表明光学低通滤波器可以有效地限制图像的频谱宽度,使抽样满足奈奎斯特条件,达到消除频谱混叠,改善重建图像质量的目的.